{"created":"2023-05-25T05:23:26.735761+00:00","id":911,"links":{},"metadata":{"_buckets":{"deposit":"eab1c664-cd6a-4ad7-8db5-a7dc6db36ac2"},"_deposit":{"created_by":3,"id":"911","owners":[3],"pid":{"revision_id":0,"type":"depid","value":"911"},"status":"published"},"_oai":{"id":"oai:yamagata.repo.nii.ac.jp:00000911","sets":["34:36:182"]},"author_link":["3908","3910","3909","3911"],"item_3_alternative_title_18":{"attribute_name":"その他の言語のタイトル","attribute_value_mlt":[{"subitem_alternative_title":"Wet etching velocity of silicon oxide film"}]},"item_3_alternative_title_19":{"attribute_name":"タイトル（ヨミ）","attribute_value_mlt":[{"subitem_alternative_title":"シリコン サンカマク ノ ウェットエッチング ソクド"}]},"item_3_biblio_info_6":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2008-02-15","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"54","bibliographicPageStart":"45","bibliographicVolumeNumber":"30","bibliographic_titles":[{"bibliographic_title":"山形大学紀要. 工学 = Bulletin of Yamagata University. Engineering"}]}]},"item_3_description_42":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"subitem_description":"論文(Article)","subitem_description_type":"Other"}]},"item_3_description_5":{"attribute_name":"内容記述","attribute_value_mlt":[{"subitem_description":"Abstract : The experimental studies were carried out extensively on the relationships between the etching velocity of silicon oxide film and the concentration of each ion species contained in the etching solutions. From our studies, the following results were obtained. It was found that the etching reaction of silicon oxide film was controlled by the chemical species of H~+, HF_2~ and HF. And it was also shown that the measured values were well correlated by Eq.(18) which was derived by assuming the reaction model of prigogine on the reaction mechanism. The parameters of Eq.(18) were decided by the esxperimental values, and the empirical equation (28) of the etching rate of thermal oxidation film was proposed by considering the temperature dependency.","subitem_description_type":"Other"}]},"item_3_full_name_3":{"attribute_name":"著者別名","attribute_value_mlt":[{"nameIdentifiers":[{"nameIdentifier":"3910","nameIdentifierScheme":"WEKO"}],"names":[{"name":"Toda,  Masayuki"}]},{"nameIdentifiers":[{"nameIdentifier":"3911","nameIdentifierScheme":"WEKO"}],"names":[{"name":"Yamamoto,  Kohei"}]}]},"item_3_publisher_32":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"山形大学"}]},"item_3_source_id_9":{"attribute_name":"書誌レコードID","attribute_value_mlt":[{"subitem_source_identifier":"AN00242991","subitem_source_identifier_type":"NCID"}]},"item_3_text_33":{"attribute_name":"出版者（ヨミ）","attribute_value_mlt":[{"subitem_text_value":"ヤマガタ ダイガク"}]},"item_3_text_34":{"attribute_name":"別言語の出版者","attribute_value_mlt":[{"subitem_text_value":"Yamagata University"}]},"item_3_text_43":{"attribute_name":"資源タイプ・ローカル","attribute_value_mlt":[{"subitem_text_value":"紀要論文"}]},"item_3_text_44":{"attribute_name":"資源タイプ・NII","attribute_value_mlt":[{"subitem_text_value":"Departmental Bulletin Paper"}]},"item_3_text_45":{"attribute_name":"資源タイプ・DCMI","attribute_value_mlt":[{"subitem_text_value":"text"}]},"item_3_text_46":{"attribute_name":"資源タイプ・ローカル表示コード","attribute_value_mlt":[{"subitem_text_value":"2"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"都田,  昌之"}],"nameIdentifiers":[{}]},{"creatorNames":[{"creatorName":"山本,  康平"}],"nameIdentifiers":[{}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_date","date":[{"dateType":"Available","dateValue":"2015-08-21"}],"displaytype":"detail","filename":"kiyoue-30-045to054.pdf","filesize":[{"value":"410.9 kB"}],"format":"application/pdf","licensetype":"license_note","mimetype":"application/pdf","url":{"label":"kiyoue-30-045to054.pdf","url":"https://yamagata.repo.nii.ac.jp/record/911/files/kiyoue-30-045to054.pdf"},"version_id":"1973d402-a328-4f80-b79e-15dc9f3deda4"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"シリコン酸化膜のウェットエッチング速度","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"シリコン酸化膜のウェットエッチング速度"}]},"item_type_id":"3","owner":"3","path":["182"],"pubdate":{"attribute_name":"公開日","attribute_value":"2008-03-06"},"publish_date":"2008-03-06","publish_status":"0","recid":"911","relation_version_is_last":true,"title":["シリコン酸化膜のウェットエッチング速度"],"weko_creator_id":"3","weko_shared_id":3},"updated":"2023-05-25T06:18:52.737841+00:00"}